Acta Anatomica Sinica ›› 2018, Vol. 49 ›› Issue (2): 258-263.doi: 10.16098/j.issn.0529-1356.2018.02.020

• Bioengineering • Previous Articles     Next Articles

Finite element analysis of the effect of implantation depth on the distribution of bone stress around the platform switching implant according to type Ⅱ and Ⅲ bone

FU Hong-yu1 CHEN Nan1 FENG Guang-zhi 2*   

  1. 1. Department of Stomatology, Peking University First Hospital, Beijing 100034,China;2. Department of Stomatology, Beijing Haidian Hospital, Beijing 100080, China
  • Received:2017-03-14 Revised:2017-05-30 Online:2017-04-06 Published:2018-04-06
  • Contact: FENG Guang-zhi E-mail:dreamvon@163.com

Abstract:

Objective To analyze the Platform Switching implant-supported denture in posterior mandibular area, to compare the maximal stress value of the bone around the implant with the implant depth, and to use the stress distribution around the implants to guide the clinical selection of appropriate planting program. Methods A simplified model of the alveolar bone in the posterior region of the mandible was drawn using Abaqus 6.13. The simplified model of the straight crown of the mandibular first molar was obtained with the Straumann bone-level implant. Abaqus CAE 6.13 was used to perform finite element analysis to observe the maximal stress of the cortical bone around the implant in different implant depths. The maximal stress of the cortical bone around the implant was measured at different implant depths. Results The maximal Von Mises stress (MVMS) of the bone around the implant was observed on the surface of the cortical bone when the upper surface of the implant was shifted to the upper surface of the cortical bone. With the increase of implant depth, the MVMS in the cortical bone moved along the cortical bone around the upper surface of the implant and reached the minimum value of MVMS when the upper surface of the implant was located a half thickness of the cortical bone. Conclusion Bone stress around the platform switching implant MVMS appeared in the peri-implant cortical bone. The stress concentration of the cortical bone was mainly located in the contact area with the neck platform. Adjusting the implant depth could change the stress concentration in the cortical bone. The upper surface of the implant is located below the level of the alveolar ridge, which helps to relieve the stress of the alveolar crest cortical bone.

Key words: Finite element analysis, Implant, Platform switching, Stress distribution